Capítulo 253: The Most Challenging Obstacle

The challenges in producing the lithograph machine lie in three critical components: The light source, the double workpiece platform and lithograph lens.

It was doubtless that Z country was the best when it came to producing the light sources. This could be concluded from their laser weapons, which were obviously way more advanced than those from Merica.

A tiny little light source was a piece of cake for the scientists of Z country.

The double workpiece platform was slightly harder. It was said that the double workpiece platform developed by ASML was based on the magnetic suspension plane motor. The motion control of the photoresist had been honed to a highly precise 2 nanometers. This greatly improved the precision and efficiency of chip processing.

Foreign specialists had arrogantly proclaimed that "no other organisation will be able to produce such an advanced double workpiece platform".